Short Description
Das Gerät erlaubt es, auf atomarer Ebene geordnete Oxid-Schichten herzustellen. Neben der Herstellung von reinen Oxiden ist auch die Herstellung von Mischoxiden, wie etwa Perowskiten möglich. Die hergestellten Proben können im angeschlossenen Oberflächen-Analysesystem detailliert charakterisiert werden.
Contact Person
Univ. Prof. Dr. Ulrike Diebold
Research Services
This setup combines a ultrahigh vacuum (UHV) surface analysis system with surface preparation facilities with a state-of-the-art pulsed laser deposition (PLD) system with epitaxial control. All sample transfer and preparation is contained in UHV with a base pressure of low 10-10 mbar.
This 4-chamber system allows the judicious growth and surface characterization single-crystalline, complex oxides with atomic control. Typical sample size: 5x5 mm2.
1) Surface preparation:
Load-lock with fast-sample entry. Sample manipulator with electron beam heater, ion source for sputtering, evaporators for physical vapour deposition, and a quartz crystal microbalance for thin-film measurements.
2) Surface characterisation:
XPS, ISS, LEED, variable temperature STM
3) PLD growth:
Pulsed Excimer laser, multiple-target carousal, fast-entry load-lock, hi-pressure RHEED system, movable quartz crystal microbalance, sample heating with diode laser, pyrometer for temperature measurement, gas inlet system with flow controllers, automated control for deposition/temperature/gas ramps.
4) Transfer chamber connecting the PLD and surface characterization chamber
Storage of multiple samples.
Methods & Expertise for Research Infrastructure
Das System ergänzt die Forschung über Oxidoberflächen um die Möglichkeit, derartige Oberflächen in höchster Qualität zu präparieren.