Short Description
Oxford Instruments' PlasmaPro®100 PECVD (Plasma Enhanced Chemical Vapour Deposition) is a versatile instrument that can deposit silicon oxide, silicon nitride, Silicon carbide, amorphous silicon, and other films.
Contact Person
Heimo Müller
Research Services
Research Services
PECVD deposition of Silicon-based thin films on wafers up to 8“.
Methods & Expertise for Research Infrastructure
Material-Portfolio:
• SiNx
• SiO2
• SiC
• a-Si
Allocation to research infrastructure
The terms of use are to be agreed individually. Send your request to the indicated contact. The GTC of SAL apply: https://silicon-austria-labs.com/agb/