Short Description
The Thermo Scientific Helios 5 Plasma FIB (PFIB) DualBeam (focused ion beam scanning electron microscope, or FIB-SEM) delivers unmatched capabilities for materials science and semiconductor applications. For materials science researchers, the Helios 5 PFIB DualBeam provides large-volume 3D characterization, gallium-free sample preparation, and precise micromachining. The instrument also has EDS (Energy dispersive spectroscopy) and ToF-SIMS (time of flight secondary ion mass spectroscopy) detectors to characterize material chemistry. Additionally, a cryo-stage is available for polymers or air-sensitive material characterizations.
Contact Person
Megan Cordill
Research Services
Materials characterization at the micro and nanoscales
Methods & Expertise for Research Infrastructure
The Helios Plasma FIB is a dual-beam instrument combining a high-resolution scanning electron microscope (SEM) with a plasma ion beam, enabling nanoscale analysis of materials. Key methods include cross-sectioning and TEM sample preparation, 3D slice-and-view tomography, ion beam milling at cryo-genic temperatures, and SEM-based compositional characterization (EDS/TOF-SIMS). This infrastructure supports in-depth investigation of microstructure, phase composition, and defect chemistry across a broad range of advanced materials.