Kurzbeschreibung
This Laser lithography system is a highly versatile, high-resolution pattern generator for direct writing and low-volume mask making.
Ansprechperson
Heimo Müller
Research Services
Research Services
• 200 mm down 1 cm2 substrate size
• i-line band (375 nm) for negative and positive resist exposures
• grayscale mode for 2.5D pattering
• minimum feature size 1 um
Methoden & Expertise zur Forschungsinfrastruktur
The Heidelberg DWL 66 is used for R&D) in microelectronics, MEMS, microfluidics, sensors, non-standard substrates and advanced packaging and any academic application that requires microstructure fabrication.
Zuordnung zur Forschungsinfrastruktur
The terms of use are to be agreed individually. Send your request to the indicated contact. The GTC of SAL apply: https://silicon-austria-labs.com/agb/