Kurzbeschreibung
The Helios G4 is a combined electron / focused ion beam microscope for topography and morphology analysis of micro- and nanostructures as well as the structuring of thereof. The system is equipped with a Bruker EDX detector, which allows to determine the composition of chemical elements in a sample.
Ansprechperson
Heimo Müller
Research Services
Research Services
• High resolution imaging
• EDX composition analysis
• Cross sections via Focus Ion Beam
• Small surface structurin via Focus Ion Beam
• Ebeam Lithography
Methoden & Expertise zur Forschungsinfrastruktur
Key Specifications:
• Up to 200 mm wafers – stage movement 150 mm x 150 mm
• High resolution SEM imaging with in-lens mode
• Electron column and Ion column (Ga-Ions) up to 30 kV
• Ion beam patterning and Gas injection system for Pt deposition and insulator enhanced etch (XeF2)
• SE detectors: ETD, TLD
• BSE detectors: TLD, MD, ICD, ABS, CBS
• EDX detector
• Software: XT microscope, Maps plugin, Nanobuilder plugin
• Add on 2022 : EBL Lithography capability with the software Elphy Multibeam (RAITH)