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Large equipment

ZEISS 1540XB CrossBeam

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JKU - Johannes Kepler University Linz

Linz | Website

Open for Collaboration

Short Description

ZEISS 1540XB CrossBeam is a ultra high resolution GEMINI® field emission column with the high performance Focused Ion Beam column into one integrated system. It gives the possibility to get live SEM-Imagination during FIB operation. Furthermore it allowes fully controlled targed preperations. The stage supports mechanically eucentric movements as well as compucentric rotation and tilting. A Gas Injection System (5 Gases) offers selective etching, enhanced etching, material deposition or isulator deposition. Also included is a micromanipulator for in situ samplehandling. There is also a variaty of different detectors to use, as SE, Inlens, BSE, EBSD (HKL) and EDX (Oxford).

Contact Person

DI Dr. Heiko Groiss

Research Services

ZEISS 1540XB CrossBeam is a ultra high resolution GEMINI® field emission column with the high performance Focused Ion Beam column into one integrated system. It gives the possibility to get live SEM-Imagination during FIB operation. Furthermore it allowes fully controlled targed preperations. The stage supports mechanically eucentric movements as well as compucentric rotation and tilting. A Gas Injection System (5 Gases) offers selective etching, enhanced etching, material deposition or isulator deposition. Also included is a micromanipulator for in situ samplehandling. There is also a variaty of different detectors to use, as SE, Inlens, BSE, EBSD (HKL) and EDX (Oxford).

Methods & Expertise for Research Infrastructure

ZEISS 1540XB CrossBeam is a ultra high resolution GEMINI® field emission column with the high performance Focused Ion Beam column into one integrated system. It gives the possibility to get live SEM-Imagination during FIB operation. Furthermore it allowes fully controlled targed preperations. The stage supports mechanically eucentric movements as well as compucentric rotation and tilting. A Gas Injection System (5 Gases) offers selective etching, enhanced etching, material deposition or isulator deposition. Also included is a micromanipulator for in situ samplehandling. There is also a variaty of different detectors to use, as SE, Inlens, BSE, EBSD (HKL) and EDX (Oxford).

Allocation to research infrastructure

ZONA - Center for Surface and Nanoanalytics

Terms of Use

For details please contact the responsible scientist. See JKU website https://www.jku.at/zona/

Cooperation Partners

voestalpine Stahl GmbH
Robert Bosch AG Austria
EV Group E. Thallner GmbH
Christian Doppler Labor für Nanoskalige Phasenumwandlungen

Reference Projects

CDL-MS-MACH Christian Doppler Laboratory for Microscopic and Spectroscopic Material Characterisation Motivation. https://www.jku.at/zentrum-fuer-oberflaechen-und-nanoanalytik-zona/forschung/beendete-forschungsprojekte/cdl-ms-mach/

Contact

DI Dr. Heiko Groiss
Zentrum für Oberflächen- und Nanoanalytik
+43 732 2468 5830
heiko.groiss@jku.at
https://www.jku.at/zona

Location

Location on map

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